Differentiable Computational Lithogrpahy Framework
Large-Area Fabrication-Aware Computational Diffractive Optics (SIGGRAPH Asia & TOG 2025)
Open-source computational lithography workflow, manufacturability benchmarking, and foundation model data engine for advanced EUV/curvilinear mask processes
repo for the website of neural litho project
Open Source EUV Lithography Simulator — from plasma source to CD metrology. Full-stack simulation: LPP Sn plasma → RCWA mask diffraction → TMM multilayer optics → Hopkins aerial imaging → Dill ABC resist chemistry → CD metrology. Apache 2.0.
GPU-accelerated cloud platform for OPC / inverse lithography (ILT) with native curvilinear mask support — GDS/OASIS in, corrected masks out.
广东工业大学2025届本科毕业设计创新奖作品。This repository presents a 2025 undergraduate thesis from Guangdong University of Technology (Automation). It proposes a GNN-based lithography hotspot detection algorithm for IC layouts, received the Outstanding Innovation Award.
Per-pixel binary discrete flow matching with trajectory-attached fine-tuning for inverse lithography (OPC)
Research-grade simulator for 0.55 NA High-NA EUV lithography. Models the path from 13.5 nm source through anamorphic optics to wafer aerial image, with Mask 3D effects, photoresist, and SMO/PMWO optimization.
Rigorous 3D electromagnetic near-field simulation for lithography masks: frequency-domain vector FEM on conformal tetrahedra, with GPU assembly and a GPU sparse direct solver
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